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Chapter 1 Characteristics of Thin Films
1£®1 Definition of films
1£®2 Surface effect
1£®3 Thin film structures and defects
1£®4 Basic requirements to make a thin film
Exercises

Chapter 2 Vacuum Technology Foundation
2£®1 Basic concepts of vacuum
2£®2 Dynamics of gas
2£®3 Gas flow and gas extraction
2£®4 Vacuum acquisition
2£®5 Vacuum measurement
Exercises

Chapter 3 Plasma Technology Basis
3£®1 Basic concepts of plasma
3£®2 Classification of plasma
3£®3 Occurrence of low-temperature plasma
Exercises

Chapter 4 Physical Vapor Deposition of Thin Films
4£®1 Evaporation deposition
4£®2 Sputtering deposition
4£®3 Ion-beam deposition
4£®4 Pulsed-laser deposition
4£®5 Molecular-beam epitaxy
Exercises

Chapter 5 Chemical-vapor Deposition
5£®1 Thermochemical-vapor deposition
5£®2 Plasma-enhanced chemical-vapor deposition
5£®3 High-density plasma chemical-vapor deposition
5£®4 Other chemical-vapor deposition
Exercises

Chapter 6 Kinetics of the Process of Thin Film Growth
6£®1 Four steps of thin film growth
6£®2 Adsorption
6£®3 Surface diffusion
6£®4 Nucleation and growth of 2D islands
6£®5 Crystallization and film growth
6£®6 Growth modes
6£®7 Structure development
6£®8 Interfaces
Exercises

Chapter 7 Measurement of Film Thickness and Deposition Rate
7£®1 Optical method
7£®2 Balance method
7£®3 Electrical method
7£®4 Surface-roughness-meter method
Exercises

Chapter 8 Recent Advances of Thin Film Materials and Technology
8£®1 Recent advances in thin film fabrication technologies
8£®2 Some important electronic thin film materials
8£®3 Progresses of two-dimensional thin film materials
Exercises

References